Layout for ICs at process geometries of 90 nm and below becomes a very dicey affair. Even at 180 nm, the number of design rules that must be enforced for an ASIC or system-on- ...

Area Pitch-matched layout — abutment Symmetry in layout and, therefore, timing The most intricate example of datapath full-custom layout design is memory design. Memory layout design first depends on ...

Description Design for manufacturing (DFM) refers to actions taken during the physical design stage of IC development to ensure that the design can be accurately manufactured. At larger nodes, most of ...

Design constraints and influences have spread far beyond simple length/width measurements at 45 nm and below. Pattern Matching replaces lengthy and multi-operational text-based design rules with an ...

The patent protects IP for automatic correction of manufacturing process geometrical design rules violations in microchips layout data (Professional term; DRC).

The first is a general reluctance of analog layout engineers to approve layout generated by automated tools. When talking with layout people, even within the same company, different views are ...